Oblique Incidence Interference Method Flatness Tester 'FT-17'
Laser light oblique incidence interferometer compatible with a maximum φ130mm; image analysis using phase shift method.
This is a digital measurement of various samples by analyzing interference fringes using a phase shift method with a laser light oblique incidence interferometer. It is used in R&D and mass production lines to improve quality for semiconductor wafers (GaN, SiC, and sapphire) and magnetic disks for hard disk drives (aluminum and glass).
- Company：ニデック コート本部
- Price：Other
